Automated full-field UV Nanoimprint solution up to 200 mm, featuring EVG´s proprietary SmartNIL® technology
The EVG7200 system leverages EVG's innovative SmartNIL technology and EVG's materials expertise to enable mass manufacturing of micro- and nanoscale structures. The system brings the advanced soft stamp and imprint capability of SmartNIL to larger substrates and smaller geometries, with resolution down to 40 nm* in volume production. This enables greater cost-of-ownership (CoO) benefits and realizes the full manufacturing potential of nanoimprint lithography.
*resolution dependent on process and template
Features
- Volume-proven imprinting technology with superior replication fidelity
- Proprietary SmartNIL® technology with multiple-use polymer stamp technology
- Integrated imprinting, UV curing, demolding, and working stamp fabrication
- Automated cassette-to-cassette handling plus semi-automated R&D mode
- Optional top-side alignment
- Optional mini-environment
- Open platform for all commercially available imprint materials
- Scalability from R&D to production
- System housing for best process stability and reliability
Technical Data
| Wafer diameter (substrate size) |
|---|
| 75 up to 200 mm |
| Resolution |
|---|
| ≤ 40 nm (resolution dependent upon template and process) |
| Supported Process |
|---|
| SmartNIL® |
| Exposure source |
|---|
| High-power LED (i-line) > 400 mW/cm² |
| Alignment |
|---|
| Optional top side alignment |
| Automated separation |
|---|
| Supported |
| Mini environment and climate control |
|---|
| Optional |
| Working stamp fabrication |
|---|
| Supported |