The EVG7200 system leverages EVG's innovative SmartNIL technology and EVG's materials expertise to enable mass manufacturing of micro- and nanoscale structures. The system brings the advanced soft stamp and imprint capability of SmartNIL to larger substrates and smaller geometries, with resolution down to 40 nm* in volume production. This enables greater cost-of-ownership (CoO) benefits and realizes the full manufacturing potential of nanoimprint lithography.
*resolution dependent on process and template
Wafer diameter (substrate size) |
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75 up to 200 mm |
Resolution |
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≤ 40 nm (resolution dependent upon template and process) |
Supported Process |
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SmartNIL® |
Exposure source |
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High-power narrow-band |
Alignment |
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Optional top side alignment |
Automated separation |
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Supported |
Mini environment and climate control |
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Optional |
Working stamp fabrication |
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Supported |