Automated SmartNIL® UV Nanoimprint Lithography System

Automated full-field UV Nanoimprint solution up to 200 mm, featuring EVG´s proprietary SmartNIL® technology

The EVG7200 system leverages EVG's innovative SmartNIL technology and EVG's materials expertise to enable mass manufacturing of micro- and nanoscale structures. The system brings the advanced soft stamp and imprint capability of SmartNIL to larger substrates and smaller geometries, with resolution down to 40 nm* in volume production. This enables greater cost-of-ownership (CoO) benefits and realizes the full manufacturing potential of nanoimprint lithography.
*resolution dependent on process and template 


  • Volume-proven imprinting technology with superior replication fidelity
  • Proprietary SmartNIL® technology with multiple-use polymer stamp technology
  • Integrated imprinting, UV curing, demolding, and working stamp fabrication
  • Automated cassette-to-cassette handling plus semi-automated R&D mode
  • Optional top-side alignment
  • Optional mini-environment
  • Open platform for all commercially available imprint materials
  • Scalability from R&D to production
  • System housing for best process stability and reliability

Technical Data

Wafer diameter (substrate size)
75 up to 200 mm
≤ 40 nm (resolution dependent upon template and process)
Supported Process
Exposure source
High-power narrow-band
Optional top side alignment
Automated separation
Mini environment and climate control
Working stamp fabrication

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