Full-field UV Nanoimprint Lithography system up to 200 mm utilizing flexible stamps, featuring EVG´s proprietary SmartNIL® technology
The EVG7200 system leverages EVG's innovative SmartNIL technology enabling manufacturing of micro- and nanostructures with high pattern fidelity and low residual layer. Exposure with tunable intensity is based on LED lamps. The system is capable to quickly solidify a large variety of UV-curable materials improving consequently the throughput. A high yield is obtained by a controlled and smooth demolding supported by a force measurement. Capable of printing nanostructures over a large area with unmatched throughput and low cost of ownership, the EVG7200 system with SmartNIL technology is ideally suited for volume production of next-generation microfluidic and photonic devices, such as diffractive optical elements (DOEs).
*resolution dependent on process and template.
Features
- Volume-proven imprinting technology with superior replication fidelity
- Proprietary SmartNIL® technology with multiple-use polymer stamp technology
- Integrated imprinting, UV curing demolding, and working stamp fabrication
- Available in manual or automated configuration
- Automated cassette-to-cassette handling plus semi-automated R&D mode
- Substrate size from pieces to 200 mm
- Chuck with heating function
- Optional top-side alignment
- Optional mini-environment
- Open platform for all commercially available imprint materials
- Scalability from R&D to production
- System housing for best process stability and reliability
Technical Data
| Wafer diameter (substrate size) |
|---|
| 75 up to 200 mm |
| Resolution |
|---|
| ≤ 40 nm (resolution dependent upon template and process) |
| Supported Process |
|---|
| SmartNIL® |
| Exposure source |
|---|
| High-power narrow-band |
| Alignment |
|---|
| Optional top side alignment |
| Automated separation |
|---|
| Supported |
| Mini environment and climate control |
|---|
| Optional |
| Working stamp fabrication |
|---|
| Supported |
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