HERCULES® NIL

Fully Integrated SmartNIL® UV-NIL Systems

HERCULES® NIL fully integrated SmartNIL® UV-NIL system up to 200 mm

A fully integrated nanoimprint lithography solution for high-volume manufacturing, featuring EVG´s proprietary SmartNIL® imprinting technology

The HERCULES NIL, a fully integrated UV nanoimprint lithography track solution for wafers up to 200 mm, is the latest addition to EVG’s NIL product portfolio. Based on a modular platform, the HERCULES NIL combines EVG’s proprietary SmartNIL imprinting technology with cleaning, resist coating and baking pre-processing steps. This turns the HERCULES NIL into a “one stop shop”, where bare wafers are loaded into the tool and fully processed nanostructured wafers are returned.

To optimize the process chain, fabrication of multiple-use soft stamps – which are a cornerstone for high-volume production – is included in the HERCULES NIL without requiring additional imprint stamp manufacturing equipment. As a special feature, the tool can be upgraded with a Class 1* (ISO 3) capable mini-environment to guarantee the lowest defect rates and highest-quality master replication.

By providing a complete NIL solution for high-volume manufacturing, the HERCULES NIL strengthens EVG’s leadership position in full-area NIL equipment solutions.
* according to US FED STD 209E

Features

  • Volume manufacturing of structures down to 40 nm* and smaller
  • Combines pre-processing (clean / coat / bake / chill) and SmartNIL®
  • Volume-proven imprinting technology with superior replication fidelity
  • Fully automated imprinting and controlled low-force detachment for maximum working stamp reusability
  • Includes working stamp manufacturing capability
  • Fastest curing times due to high-power light source
  • Optimized modular platform for high throughput

*resolution dependent on process and template 

HERCULES NIL

HERCULES® NIL fully modular and integrated SmartNIL® UV-NIL system up to 300 mm

A fully modular platform incorporating EVG’s SmartNIL® technology to support AR/VR, 3D sensor, photonic and biotechnology production applications

EVG’s HERCULES NIL 300 mm is a fully integrated track system that combines cleaning, resist coating and baking pre-processing steps with EVG’s proprietary SmartNIL large-area nanoimprint lithography (NIL) process in a single platform for wafers up to 300 mm in diameter. It is the first NIL system based on EVG’s fully modular equipment platforms with swappable modules to give customers maximum freedom to configure their systems to best meet their production needs, including bridge capabilities for 200 mm and 300 mm wafers.

The HERCULES NIL 300 mm provides the most advanced nanoimprint capabilities on the market with low force and conformal imprinting, fast high-power exposure and smooth stamp detachment. The system supports the production of a variety of devices and applications, including optical devices for augmented/virtual reality (AR/VR) headsets, 3D sensors, bio-medical devices, nanophotonics and plasmonics.

Features

  • Fully automated UV-NIL imprinting and low-force detachment
  • Up to 300 mm substrates
  • Fully modular platform with up to eight swappable process modules (imprinting and pre-processing)
  • 200 mm / 300 mm bridge-tool capability
  • Full-area imprint coverage
  • Volume manufacturing of structures down to 40 nm and smaller
  • Supports a wide range of structure sizes and shapes, including 3D
  • Applicable on high-topography (rough) surfaces

*resolution dependent on process and template 

HERCULES NIL

Technical Data

Wafer diameter (substrate size)
100 up to 200 mm / 200 and 300 mm
Resolution
≤ 40 nm (resolution dependent upon template and process)
Supported Process
SmartNIL®
Exposure source
High-power LED (i-line) > 400 mW/cm²
Alignment
≤ ± 3 µm
Automated separation
Supported
Pre-processing
All pre-processing modules available
Mini environment and climate control
Optional
Working stamp fabrication
Supported

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