Automated full-field UV Nanoimprint solution up to 150 mm, featuring EVG´s proprietary SmartNIL® technology
The EVG720 system leverages EVG's innovative SmartNIL technology and materials expertise to enable mass manufacturing of micro- and nanoscale structures. Capable of printing nanostructures as small as 40 nm* over a large area with unmatched throughput and low cost of ownership, the EVG720 system with SmartNIL technology is ideally suited for volume production of next-generation microfluidic and photonic devices, such as diffractive optical elements (DOEs).
*resolution dependent on process and template
Features
- Volume-proven imprinting technology with superior replication fidelity
- Proprietary SmartNIL® technology with multiple-use polymer stamp technology
- Integrated imprinting, UV curing demolding, and working stamp fabrication
- Automated cassette-to-cassette handling plus semi-automated R&D mode
- Optional top-side alignment
- Optional mini-environment
- Open platform for all commercially available imprint materials
- Scalability from R&D to production
- System housing for best process stability and reliability
Technical Data
| Wafer diameter (substrate size) |
|---|
| 75 up to 150 mm |
| Resolution |
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| ≤ 40 nm (resolution dependent upon template and process) |
| Supported Process |
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| SmartNIL® |
| Exposure source |
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| High-power LED (i-line) > 400 mW/cm² |
| Alignment |
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| Optional top side alignment |
| Automated separation |
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| Supported |
| Mini environment and climate control |
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| Optional |
| Working stamp fabrication |
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| Supported |