The EVG720 system leverages EVG's innovative SmartNIL technology and materials expertise to enable mass manufacturing of micro- and nanoscale structures. Capable of printing nanostructures as small as 40 nm* over a large area with unmatched throughput and low cost of ownership, the EVG720 system with SmartNIL technology is ideally suited for volume production of next-generation microfluidic and photonic devices, such as diffractive optical elements (DOEs).
*resolution dependent on process and template
Wafer diameter (substrate size) |
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75 up to 150 mm |
Resolution |
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≤ 40 nm (resolution dependent upon template and process) |
Supported Process |
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SmartNIL® |
Exposure source |
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High-power LED (i-line) > 400 mW/cm² |
Alignment |
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Optional top side alignment |
Automated separation |
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Supported |
Mini environment and climate control |
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Optional |
Working stamp fabrication |
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Supported |