EVG®7200

Automated SmartNIL® UV Nanoimprint Lithography System

Automated full-field UV Nanoimprint solution up to 200 mm, featuring EVG´s proprietary SmartNIL® technology

The EVG7200 system leverages EVG's innovative SmartNIL technology and EVG's materials expertise to enable mass manufacturing of micro- and nanoscale structures. The system brings the advanced soft stamp and imprint capability of SmartNIL to larger substrates and smaller geometries, with resolution down to 40 nm* in volume production. This enables greater cost-of-ownership (CoO) benefits and realizes the full manufacturing potential of nanoimprint lithography.
*resolution dependent on process and template 

Features

  • Volume-proven imprinting technology with superior replication fidelity
  • Proprietary SmartNIL® technology with multiple-use polymer stamp technology
  • Integrated imprinting, UV curing, demolding, and working stamp fabrication
  • Automated cassette-to-cassette handling plus semi-automated R&D mode
  • Optional top-side alignment
  • Optional mini-environment
  • Open platform for all commercially available imprint materials
  • Scalability from R&D to production
  • System housing for best process stability and reliability
EVG7200

Technical Data

Wafer diameter (substrate size)
75 up to 200 mm
Resolution
≤ 40 nm (resolution dependent upon template and process)
Supported Process
SmartNIL®
Exposure source
High-power LED (i-line) > 400 mW/cm²
Alignment
Optional top side alignment
Automated separation
Supported
Mini environment and climate control
Optional
Working stamp fabrication
Supported

Talk to our EVG product experts!

Questions?

Explore our other products in this category