The tool supports a variety of standard lithography processes, such as vacuum-, soft-, hard- and proximity exposure mode, with the option of back-side alignment. In addition, the system offers conventional UV Nanoimprint Lithography (soft UV-NIL) and allows quick processing and re-tooling for changing user requirements with a conversion time between lithography and NIL of just a few minutes. Its advanced multi-user concept can be adapted from beginners to expert level, thus making it ideal for universities and R&D applications.
Wafer diameter (substrate size) |
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Standard lithography: pieces up to 150 mm |
Soft UV-NIL: pieces up to 150 mm |
Resolution |
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≤ 40 nm (resolution dependent upon template and process) |
Supported Process |
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Soft UV-NIL |
Exposure source |
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Mercury light source or UV LED light source |
Automated separation |
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Not supported |
Working stamp fabrication |
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External |
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