EV Group provides a complete product line for UV-based nanoimprint lithography (UV-NIL), including different single-step imprinting systems, large-area imprinters as well as step-and-repeat systems for efficient master fabrication. Besides soft UV-NIL, EVG offers its proprietary SmartNIL technology with multiple-use polymer stamp technology. The efficient and robust SmartNIL process provides high pattern fidelity, highly uniform patterned layers and minimum residual layers, combined with easy scalability in wafer size and production volume. EVG´s SmartNIL redeems the long-term promise of nanoimprinting being a high-performance, low-cost and volume-capable manufacturing technology for mass production of micro- and nanoscale structures.
A universal R&D mask alignment system with UV-nanoimprint capability from small pieces up to 150 mm
A universal mask alignment system with UV-nanoimprint capability featuring EVG´s proprietary SmartNIL® technology up to 100 mm
A universal mask alignment system with UV-nanoimprint capability featuring EVG´s proprietary SmartNIL® technology up to 150 mm.
Automated full-field UV-nanoimprint solution up to 150 mm, featuring EVG´s proprietary SmartNIL® technology.
Automated full-field UV-nanoimprint solution up to 200 mm, featuring EVG´s proprietary SmartNIL® technology
Multifunctional UV Nanoimprint Lithography system up to 300mm featuring SmartNIL® technology, lens molding and lens stacking in one tool
Unmatched conformal nanoimprint lithography over large area.
A fully integrated nanoimprint lithography solution for high-volume manufacturing, featuring EVG´s proprietary SmartNIL® imprinting technology.
Step-and-Repeat Nanoimprint Lithography for Efficient Master Fabrication.