Hybrid bonding extends fusion bonding with embedded metal pads in the bond interface, allowing for face-to-face connection of wafers. The main application for hybrid bonding is in advanced 3D device stacking.
Fusion or direct wafer bonding enables permanent connection via dielectric layers on each wafer surface used for engineered substrate or layer transfer such as backside illuminated CMOS image sensors.
Fusion or direct wafer bonding allows dielectric layers and more precisely activated dangling of functional groups to bridge between wafers with the help of hydrogen bridge bonds. This pre-bonding step takes place at room temperature and atmospheric condition. Only during a subsequent annealing step are low-energy hydrogen bridge bonds turned into covalent bonds. Fusion bonding is traditionally applied for engineered substrates and more recently to stack wafers using full-area dielectrics. Due to pre-bonding at ambient conditions, a very high alignment of less than 100 nm allows for 3D integration scenarios using wafer-to-wafer fusion bonding. In addition, copper pads can be processed in parallel with the dielectric layer, allowing one to pre-bond the dielectric layer at ambient temperature, while electrical contacting can be achieved during annealing via metal diffusion bonding. This special case is called hybrid bonding. The main applications for hybrid bonding include CMOS image sensors, memory as well as 3D system-on-chip (SoC).
Visit EVG's booth at The International Conference on Wafer Bonding and listen to our talks:
"Impact of Surface Condition on In-Plane Distortion in Si Wafer Bonding: Correlation with Adhesion Energy and Bondwave Propagation Speed" by Technology Development Dr. Christoph Flötgen.
“Advanced IR Laser Debonding on Silicon Wafers for RDL- first FOWLP” by Supervisor Process Technology Peter Urban.
“D2W Bonding of III-V and piezo electrical materials for Heterogeneous Integration” by Team Leader Process Technology Mariana Pires.
“Comprehensive Bond strength optimization of LiTaO3 bonding using ComBond Technology” by Supervisor Process Technology Michael Dornetshumer.
“ComBond Bonding of Diamond and other Materials for Advanced Thermal Management” by Senior Process Technology Engineer Matthias Danner.
and visit the Poster Presentation, where we present following topic:
“Comparative Analysis of Atmospheric and ComBond-Activated TiTi thermos-compression Bonding” by Team Leader Process Technology Thomas Stöttinger.
Visit our booth #B1241 at SEMICON EUROPA 2025 & visit our poster presentation at the APC:
"High Throughput Digital Lithography Development for 3D Device Integration " held by Business Development Manager Dr. Ksenija Varga.
Contact the EVG experts