The versatile EVG®7300 UV Nanoimprint Lithography System can support multiple related UV processes: SmartNIL, Wafer Level Optics (WLO) and Stacking – three capabilities merged in one flexible tool.
It is a standalone system based on the modularized and improved SmartNIL module, which can be configured depending on handling and automation levels. Supporting wafer sizes from 150 mm up to 300 mm and featuring high-precision alignment down to 300 nm, advanced process control and high throughput, the EVG®7300 can serve advanced R&D up to high-volume manufacturing (HVM) needs for a variety of freeform and high precision nano- and micro optical components and devices. For the necessity of integrated pre- and post-process flows in HVM environments, the module can be integrated into the HERCULES NIL system.
This multi-functional system is designed to serve a wide range of emerging applications involving micro- and nanoimprints as well as UV-stacking of functional layers. Thus, the equipment enables enhanced process performance for wafer-level optics (WLO), nanophotonics, metasurfaces and biomedical chips. This is closely related to the industry needs for novel optical sensors and optoelectronics to enable e.g. autonomous driving, micro lens arrays and projectors in automotive and decorative lighting, diffractive optics for biometric authentication as well as emerging trends for sophisticated meta-lenses. First applications utilizing this technology already exist today in the field of advanced biomedical devices and augmented reality waveguides where nanoimprinting enables high quality manufacturing of complex designs.
|Wafer diameter (substrate size)|
|Up to 300 mm|
|≤ 10 nm (depending on process and material*)|
|*master needs to be provided by customer|
|UV LED lamp up to high power (500mW/cm²)|
|Dual wavelength operation possible: 365nm or 405nm|
|<± 300nm (process dependent)|
|Working stamp fabrication|