Anodic Bonding
Anodic bonding for interlayer free Si-glass bonding
Introduction
Anodic bonding is a technique to produce hermetic sealing between silicon/metals and glass insulators without using an intermediate layer. Borosilicate glass with high alkali ion concentration is a major requirement for this process. Different from other bonding techniques, anodic bonding involves heating and applying an electric field to the substrate materials.
Anodic bonding is also called field assisted bonding or electrostatic sealing. A clean wafer surface and atomic contact between the substrates is required for anodic bonding. Bonding takes place when the wafers are placed between the chuck and the temperature is increased to just below the glass transition temperature of glass, followed by applying electric potential of several hundred volts. After reaching a certain temperature, the oxides dissociate and alkali ions are driven into the glass by an electric field resulting in an oxygen-rich layer at the interface of the wafers. Oxygen ions are driven into the silicon surface by the electric field resulting in the formation of silicon dioxide. With specific applied pressure and voltage, the total bond process time is between 5 to 20 minutes.
Features
- Hermetic sealing
- Stable bonding
- Bonding below 4500C
- Low restrictions for Si surface
- High bond yield
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Events
SEMICON EUROPA 2026
Treffen Sie das EVG-Team am Stand #B1241 und besuchen Sie unsere Poster-Präsentationen auf der APC:
"Software-Driven Strategies for Advanced Multi-Die Patterning in Digital Lithography" von Business Development Manager Dr. Ksenija Varga und “Leveraging Advanced Bonding Technologies to Enable Scalable Co-Packaged Optics Architectures” von Business Development Manager Elisabeth Brandl.
Hier finden Sie nähere Infos zum Program.
Darüber hinaus wird unser Corporate Sales & Marketing Director Thomas Uhrmann Teil der Podiumsdiskussion „SEMICONDUCTOR TOUR 2026“ sein, welche von der YOLE Group am 12. November im Novotel München Messe veranstaltet wird. Für mehr Informationen klicken Sie hier.
Industrial Print Integration Conference (IPI) 2026
Hören Sie sich unsere Keynote an: “Advancing AR/VR and CPO: EV Group’s Inkjet Solutions for Next-Generation Optics” gehalten vonJohanna Rimböck (Technology Development).
Mehr Informationen zum Programm finden Sie hier.
EPTC 2026
Besuchen Sie unseren Stand #2 & hören Sie sich unsere Vorträge an:
"Scalable Manufacturing Approaches for Co-Packaged Optics via NIL and Advanced Wafer Bonding" gehalten von Director Business Development Dr. Bernd Dielacher und
“Advancing 310×310 mm² Panel Level Packaging: High Throughput Pathways to High Yield 3D Integration” und “Plasma–Enabled Die Singulation on Film Frame Carrier for Advanced HBM and Logic Die Integration” von Business Development Manager Dr. Ksenija Varga.
“Hybrid Bonding Overlay Reduction Through Lithographic Pre-Compensation of the Residual Fingerprint” von Technical Program Manager Sander Grosemans.
EVG & Brewer Science: “Polymer Buffer Layer Enabling a Novel RDL–First Process Flow using a Silicon Carrier and IR Laser Debonding Technology” shared presentation, Peter Urban & Brewer Science.
EVG & CEA–Leti: “Nanometer Level Chip- Scale Transfer Enabled by IR Laser Debond Technology”.
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