EVG®770
Step-and-Repeat Nanoimprint Lithography System
Step-and-Repeat Nanoimprint Lithography for Efficient Master Fabrication
The EVG770 is a versatile platform for step-and-repeat nanoimprint lithography for efficient master fabrication or direct patterning of complex structures on substrates. This approach allows uniform replication of templates from small dies up to 50 mm x 50 mm over large areas up to 300 mm substrate sizes. In combination with diamond turning or direct writing methods, step-and-repeat imprinting is frequently used to efficiently fabricate masters required for wafer-level optics manufacturing or EVG’s SmartNIL process.
Key features of the EVG770 include precise alignment capabilities, full process control and the flexibility to address requirements of a wide variety of devices and applications.
Features
- Efficient master fabrication of microlenses for wafer-level optics down to nanostructures for SmartNIL®
- Simple implementation of different kind of masters
- Variable resist dispense modes
- Live image during dispensing, imprinting and demolding
- In-situ force control for imprint and demolding
- Optional optical wedge error compensation
- Optional automated cassette-to-cassette handling
Technical Data
| Wafer diameter (substrate size) |
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| 100 up to 300 mm |
| Resolution |
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| ≤ 50 nm (resolution dependent upon template and process) |
| Supported Process |
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| Soft UV-NIL |
| Exposure source |
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| High-power LED (i-line) > 100 mW/cm² |
| Alignment |
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| Top side microscope for live overlay alignment ≤ ± 500 nm and fine alignment ≤ ± 300 nm |
| First print die to die placement accuracy |
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| ≤ 1 µm |
| Active imprint area |
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| Up to 50 x 50 mm |
| Automated separation |
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| Supported |
| Pre-processing |
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| Coating: droplet dispense (optional) |
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