リソグラフィ装置
EVG’s key competencies in lithographic technology lie in the high-throughput contact and proximity exposure capabilities of its mask aligners and the in-house process knowledge of its resist processing systems. All of EVG's lithography equipment platforms are 300 mm ready, can be fully integrated into its HERCULES lithography track systems, and are complemented by its metrology tools for top-to-bottom side alignment verification.
EVG constantly looks ahead to future market trends and thus provides application-specific solutions, particularly in the optical 3D sensing and photonics market where EVG’s process and materials expertise – derived from extensive optimization research with a wide range of resist materials – is unsurpassed. Understanding customer needs and providing efficient worldwide support are important ingredients in the success of EVG’s lithography solutions.
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