リソグラフィ装置

EVG’s key competencies in lithographic technology lie in the high-throughput contact and proximity exposure capabilities of its mask aligners and its newly developed, revolutionary and highly versatile maskless exposure lithography systems. These capabilities are complemented by its resist coating and resist development systems with advanced in-house process competences and hands-on development skills.

Most of EVG’s lithography equipment platforms are 300-mm ready, can be fully integrated into EVG’s HERCULES® lithography track systems, and are complemented by its metrology tools for top-to-bottom-side alignment verification.

EVG constantly looks ahead to future market trends and thus provides application-specific solutions, particularly in advanced packaging, MEMS, compound semiconductors, photonics and biomedical markets where EVG’s process and materials expertise – derived from extensive research with a wide range of resist materials – is unsurpassed. Understanding customer needs and providing efficient worldwide support are important ingredients in the success of EVG’s lithography solutions.