Step-and-Repeat Nanoimprint Lithography System

Step-and-Repeat Nanoimprint Lithography for Efficient Master Fabrication

The EVG770 is a versatile platform for step-and-repeat nanoimprint lithography for efficient master fabrication or direct patterning of complex structures on substrates. This approach allows uniform replication of templates from small dies up to 50 mm x 50 mm over large areas up to 300 mm substrate sizes. In combination with diamond turning or direct writing methods, step-and-repeat imprinting is frequently used to efficiently fabricate masters required for wafer-level optics manufacturing or EVG’s SmartNIL process.

Key features of the EVG770 include precise alignment capabilities, full process control and the flexibility to address requirements of a wide variety of devices and applications.


  • Efficient master fabrication of microlenses for wafer-level optics down to nanostructures for SmartNIL®
  • Simple implementation of different kind of masters
  • Variable resist dispense modes
  • Live image during dispensing, imprinting and demolding
  • In-situ force control for imprint and demolding
  • Optional optical wedge error compensation
  • Optional automated cassette-to-cassette handling 

Technical Data

Wafer diameter (substrate size)
100 up to 300 mm
≤ 50 nm (resolution dependent upon template and process)
Supported Process
Exposure source
High-power LED (i-line) > 100 mW/cm²
Top side microscope for live overlay alignment ≤ ± 500 nm and fine alignment ≤ ± 300 nm
First print die to die placement accuracy
≤ 1 µm
Active imprint area
Up to 50 x 50 mm
Automated separation
Coating: droplet dispense (optional)

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