Automated UV Nanoimprint solution up to 300 mm, featuring EVG´s proprietary SmartNIL® technology
The EVG7300 leverages EVG´s SmartNIL technology to enable mass manufacturing of micro- and nanostructures.
Capable of printing nanostructures as small as 40* nm over a large area with unmatched throughput and low cost of ownership, the EVG7300 supports the production of a variety of devices and applications, including optical devices for augmented/virtual reality (AR/VR) headsets, 3D sensors, bio-medical devices, nanophotonics and plasmonics.
EVG’s SmartNIL technology has also been improved and modularized for the EVG7300 system. Together with EVG´s material expertise it provides the most advanced nanoimprint capabilities on the market featuring conformal imprinting, fast curing times with high-power lamp and smooth stamp detachment.
*resolution dependent on process and template
Features
- Fully automated UV-NIL imprinting and low-force detachment
- Up to 300 mm substrates
- 200 mm / 300 mm bridge-tool capability
- Continuous mode operation
- Single-step full-area imprint process
- Volume manufacturing of structures down to 40* nm and smaller
- Supports a wide range of structure sizes and shapes, including 3D
- Applicable on high-topography (rough) surfaces
Technical Data
| Wafer diameter (substrate size) |
|---|
| 200 mm / 300 mm |
| 150 mm / 200 mm |
| Resolution |
|---|
| ≤ 40* nm |
| Supported Process |
|---|
| SmartNIL® |
| Exposure source |
|---|
| High-power LED (i-line) > 400 mW/cm² |
| Alignment |
|---|
| ≤ ± 3 μm |
| Stamp separation |
|---|
| Fully automated |
| Mini environment and climate control |
|---|
| Optional |
| Working stamp fabrication |
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| Supported |
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