The EVG7300 leverages EVG´s SmartNIL technology to enable mass manufacturing of micro- and nanostructures.
Capable of printing nanostructures as small as 40* nm over a large area with unmatched throughput and low cost of ownership, the EVG7300 supports the production of a variety of devices and applications, including optical devices for augmented/virtual reality (AR/VR) headsets, 3D sensors, bio-medical devices, nanophotonics and plasmonics.
EVG’s SmartNIL technology has also been improved and modularized for the EVG7300 system. Together with EVG´s material expertise it provides the most advanced nanoimprint capabilities on the market featuring conformal imprinting, fast curing times with high-power lamp and smooth stamp detachment.
*resolution dependent on process and template
Wafer diameter (substrate size) |
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200 mm / 300 mm |
150 mm / 200 mm |
Resolution |
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≤ 40* nm |
Supported Process |
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SmartNIL® |
Exposure source |
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High-power LED (i-line) > 400 mW/cm² |
Alignment |
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≤ ± 3 μm |
Stamp separation |
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Fully automated |
Mini environment and climate control |
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Optional |
Working stamp fabrication |
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Supported |
Contact the EVG experts