EVG®720

Automated SmartNIL® UV Nanoimprint Lithography System

Automated full-field UV Nanoimprint solution up to 150 mm, featuring EVG´s proprietary SmartNIL® technology

The EVG720 system leverages EVG's innovative SmartNIL technology and materials expertise to enable mass manufacturing of micro- and nanoscale structures. Capable of printing nanostructures as small as 40 nm* over a large area with unmatched throughput and low cost of ownership, the EVG720 system with SmartNIL technology is ideally suited for volume production of next-generation microfluidic and photonic devices, such as diffractive optical elements (DOEs).
*resolution dependent on process and template 

Features

  • Volume-proven imprinting technology with superior replication fidelity
  • Proprietary SmartNIL® technology with multiple-use polymer stamp technology
  • Integrated imprinting, UV curing demolding, and working stamp fabrication
  • Automated cassette-to-cassette handling plus semi-automated R&D mode
  • Optional top-side alignment
  • Optional mini-environment
  • Open platform for all commercially available imprint materials
  • Scalability from R&D to production
  • System housing for best process stability and reliability
EVG720

Technical Data

Wafer diameter (substrate size in mm)
75 up to 150
Resolution (nm)
≤ 40 (resolution dependent upon template and process)
Supported Process
SmartNIL®
Exposure source
High-power LED (i-line) > 400 mW/cm²
Alignment
Optional top side alignment
Automated separation
Supported
Mini environment and climate control
Optional
Working stamp fabrication
Supported

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