EVG®6200∞ Automated µ-CP System

For pattern creation in UV-curable materials from a prestructured stamp to a substrate.


The EVG6200∞ is the culmination of EV Group's new aligner-technology roadmap. A variety of stamps and substrates sizes from 75mm-to-200mm can be accommodated on the EVG6200∞ for nanoimprint lithography applications.


  • Nanoimprint lithography and micro contact printing
  • UV light exposure
  • Dedicated tooling for µ-CP
  • Accommodation of both soft and hard stamps
  • Type of substrates: Si, glass, compound semiconductors