EV Group wins Compound Semiconductor Manufacturing Award at the CSindustry awards 2014

Honoring EVG®PHABLE™, the first fully-automated production equipment for Eulitha's patented PHALBE™ technology which provides a unique, contact-less micro- and nano-patterning solution for periodic structures

FRANKFURT/ ST. FLORIAN, March 19, 2014 - EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, received a prestigious Compound Semiconductor Manufacturing Award at CS International 2014 for the company's EVG®PHABLE™ exposure system. The system, launched in November 2013 is the first fully-automated production equipment providing a unique nano-patterning technology for periodic structures. PHABLE™ (for "photonics enabler") is a patented technology developed by Eulithia, that is targeted for low-cost fabrication of periodic nanostructures that are mainly needed for patterned sapphire substrates (PSS) and photonic applications right now. Leveraging EVG's expertise in photolithography, the system incorporates a unique, contactless, mask-based lithography that enables full-field, high-resolution and cost-efficient micro- and nano-patterning. This new technology is taking full advantage of existing photo resist and photomask infrastructure and facilitates the creation of periodic structures, such as arrays of holes or pillars on a hexagonal or square lattice, or linear gratings over large areas, with high throughput down to a feature size of 150 nm. Unlike any conventional proximity, contact or projection lithography technologies, the printed features are independent of the exposure gap over several hundred micrometers. Therefore printing on non-flat surfaces, such as LED wafers, is easily accomplished. In summary the EVG®PHABLE™ exposure system addresses the needs of the LED and photonics industry for a reliable, high volume nano-patterning solution.

About Eulitha
Eulitha AG is a spin-off company of the Paul Scherrer Institute, Switzerland. It specializes in the development of innovative lithographic technologies for applications in optoelectronics, photonics, biotechnology, and data storage. It produces and markets nano-patterned wafers and templates using its unique EUV interference method and state-of-the-art e-beam lithography tools. PHABLE is the brand name of its new photolithography platform, which includes exposure tools and wafer patterning services. For more information about Eulitha, please visit www.eulitha.com.

Paul Lindner, Executive Technology Director, EV Group receiving the CS industry award 2014

EVG®PHABLE™ exposure system

PHABLE™ technology provides a unique, contact-less micro- and nano-patterning solution for periodic structures

About EV Group (EVG)
EV Group (EVG) is a leading supplier of equipment and process solutions for the manufacture of semiconductors, microelectromechanical systems (MEMS), compound semiconductors, power devices and nanotechnology devices.  Key products include wafer bonding, thin-wafer processing, lithography/nanoimprint lithography (NIL) and metrology equipment, as well as photoresist coaters, cleaners and inspection systems.  Founded in 1980, EV Group services and supports an elaborate network of global customers and partners all over the world.  More information about EVG is available at www.EVGroup.com.

EV Group Contacts:
Clemens Schütte
Director, Marketing and Communications
EV Group
Tel: +43 7712 5311 0
E-mail: Marketing@EVGroup.com

David Moreno
Vice President
MCA, Inc.
Tel: +1.650.968.8900, ext. 125
E-mail: dmoreno@mcapr.com