EVG®7300

Automated SmartNIL® UV Nanoimprint Lithography System

Automated UV Nanoimprint solution up to 300 mm, featuring EVG´s proprietary SmartNIL® technology

The EVG7300 leverages EVG´s SmartNIL technology to enable mass manufacturing of micro- and nanostructures. 

Capable of printing nanostructures as small as 40* nm over a large area with unmatched throughput and low cost of ownership, the EVG7300 supports the production of a variety of devices and applications, including optical devices for augmented/virtual reality (AR/VR) headsets, 3D sensors, bio-medical devices, nanophotonics and plasmonics.

EVG’s SmartNIL technology has also been improved and modularized for the EVG7300 system. Together with EVG´s material expertise it provides the most advanced nanoimprint capabilities on the market featuring conformal imprinting, fast curing times with high-power lamp and smooth stamp detachment. 

*resolution dependent on process and template

Features

  • Fully automated UV-NIL imprinting and low-force detachment
  • Up to 300 mm substrates
  • 200 mm / 300 mm bridge-tool capability
  • Continuous mode operation
  • Single-step full-area imprint process
  • Volume manufacturing of structures down to 40* nm and smaller
  • Supports a wide range of structure sizes and shapes, including 3D
  • Applicable on high-topography (rough) surfaces
EVG® 7300 SmartNIL®

Technical Data

Wafer diameter (substrate size)
200 mm / 300 mm
150 mm / 200 mm
Resolution
≤ 40* nm
Supported Process
SmartNIL®
Exposure source
High-power LED (i-line) > 400 mW/cm²
Alignment
≤ ± 3 μm
Stamp separation
Fully automated
Mini environment and climate control
Optional
Working stamp fabrication
Supported

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