EVG®770 Automated NIL Stepper

For step and repeat large area UV-Nanoimprinting processes (UV-NIL).

 

EVG provides market-leading nanoimprint lithography equipment, processes-, and technological expertise. The EVG770 is a versatile platform for step-and-repeat nanoimprint lithography for efficient master fabrication or direct patterning of complex structures on substrates. This approach allows uniform replication of templates from small dies up to 50 mm x 50 mm over large areas up to 300 mm substrate size. In combination with diamond turning or direct writing methods, step-and-repeat imprinting is frequently used to efficiently fabricate masters required for wafer-level optics manufacturing or EVG’s SmartNIL® process.
Key features of the EVG770 include precise alignment capabilities, full process control and the flexibility to address requirements of a wide variety of devices and applications.

Features

  • Efficient master fabrication of microlenses for wafer-level optics down to nanostructures for SmartNIL®
  • Simple implementation of different kind of masters
  • Variable resist dispense modes
  • Live image during dispensing, imprinting and demolding
  • Insitu force control for imprint and demolding
  • Optional optical wedge error compensation
  • Optional automated cassette-to- cassette handling