IQ Aligner® - Automated UV-NIL System

For automatic single and double-side UV-NIL processes.

Substrate/Wafer parameters: from 150 mm up to 300 mm
Stamp parameters: from 150 mm up to 300 mm
Large gap alignment accuracy: Imprinted top-to bottom side alignment accuracy: +/-2 µm (3 sigma)
Patented precision in-situ alignment
Superior pattern fidelity due to excellent contact force uniformity
Automated alignment procedure
Exposure:
Modes: soft and vacuum contact
Wavelength: 200 - 240 nm / 240 - 280 nm / 280 - 350 nm / 350 - 450 nm, filters (option)
Mercury arc lamp: 500 W/ 1000 W/ 5000 W
Handling system: up to 3 cassette stations
SECS/GEM II: Option

产品优先搜索