IQ Aligner® Automated UV Nanoimprint Lithography System

For automatic single and double-side UV-NIL processes.

 

  • Substrate/Wafer parameters: from 150 mm up to 300 mm
  • Stamp parameters: from 150 mm up to 300 mm
  • Large gap alignment accuracy: Imprinted top-to bottom side alignment accuracy: +/-2 µm (3 sigma)
  • Patented precision in-situ alignment
  • Superior pattern fidelity due to excellent contact force uniformity
  • Automated alignment procedure
  • Exposure:
    Modes: soft and vacuum contact
    Wavelength: 200 - 240 nm / 240 - 280 nm / 280 - 350 nm / 350 - 450 nm, filters (option)
    Mercury arc lamp: 500 W/ 1000 W/ 5000 W
  • Handling system: up to 3 cassette stations
  • SECS/GEM II: Option