EVG®720 Automated UV Nanoimprint Lithography System

 

  • Substrate size: up to 150mm 
  • Throughput: 40 wafers per hour*
  • Light source: high-power narrow-band exposure 
  • Automated separation: integrated 
  • Multi-use polymer stamps: > 100 imprints / stamp*
  • Stamp fabrication: integrated
  • Open material platform: open for all commercially available imprint materials
  • Alignment: Optional topside alignment 

*depending on process