The EVG620 Automated NIL System allows for imprint processes with stamps to substrates ranging from small chip size pieces up to 150 mm in diameter. Configurations for nanotechnology applications can include release mechanisms for stamps in addition to programmable high and low contact force. Uniform contact force for high yield large area printing is provided by EV Group's proprietary chuck design which supports both soft and hard stamps.
- Nanoimprint lithography and micro contact printing
- UV light exposure
- Dedicated tooling for µ-CP
- Accommodation of both soft and hard stamps
- Type of substrates: Si, glass, compound semiconductors