Resist Stripping Systems

The EVG3xxRS resist stripping platform is designed to enable the CoatsCleanprocess technology, developed in cooperation with Dynaloy LLC. This combination of engineered chemistry, sophisticated tool design and many years of process experience provides high reliability and reproducibility with low liquid consumption and short cycle times. Single wafer treatment, elaborated dispense technology and innovative chemistry activation avoid cross-contamination and eliminate the factor "bath lifetime". The EVG3xxRS resist stripping platform enhances resist stripping and post etch residue removal processes, particularly for hard to remove resists while protecting the environment.