<?xml version="1.0" encoding="UTF-8"?><rss version="2.0"><channel><title>EVG Products</title><link>http://www.evgroup.com/feeds/products1</link><description>EVG Products</description><item><id>1</id><title>&lt;p&gt;Temporary Bonding und&lt;/p&gt;
&lt;p&gt;Debonding Systeme&lt;/p&gt;</title><link>http://www.evgroup.com/de/products/bonding/temporary_bonding/?version=1</link><description /><pubDate>1/8/2010 7:28:10 AM</pubDate><author>Kinz Lisa</author><type>Section</type></item><item><id>2</id><title>&lt;p&gt;Nanoimprint Lithographie&lt;/p&gt;
&lt;p&gt;Systeme (UV-NIL, µCP, HE)&lt;/p&gt;</title><link>http://www.evgroup.com/de/products/lithography/nil_systems/?version=1</link><description /><pubDate>11/13/2009 10:51:53 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>3</id><title>IQ Aligner® Automated UV-NIL, µ-CP System</title><link>http://www.evgroup.com/de/products/lithography/nil_systems/iqaligneruvnil/?version=1</link><description>The IQ Aligner automated double-side UV-NIL system allows for micromolding and nanoimprinting processes with stamps and wafers from 150 mm to 300mm diameter.</description><pubDate>11/13/2009 10:47:19 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>4</id><title>EVG®6200∞ Automated Mask Alignment System</title><link>http://www.evgroup.com/de/products/lithography/mask_aligners/evg6200maskaligner/?version=1</link><description>With full field proximity exposure of very thick resist layers, the EVG6200 Infinity Automated Mask Alignment System targets wafer bumping and chip scale packaging markets as well as applications in MEMS, Compound Semiconductor, Power Devices and Nanotechnology.</description><pubDate>11/13/2009 10:45:32 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>5</id><title>IQ Aligner® Automated Mask Alignment System</title><link>http://www.evgroup.com/de/products/lithography/mask_aligners/lithography_iq_aligner/?version=1</link><description>The IQ Aligner Automated Mask Aligenment System is based on a field-proven, robust design with up to 300 mm wafer size capability, full-field exposure, single and double-side alignment, large gap and dark field mask alignment</description><pubDate>11/13/2009 10:45:27 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>6</id><title>EVG®620NT Automated Mask Alignment System</title><link>http://www.evgroup.com/de/products/lithography/mask_aligners/evg620nt/?version=1</link><description>Known for its high level of automation and reliability, the EVG®620NT Automated Mask Alignment System is designed for wafer-to-wafer alignment up to 150 mm wafer sizes.</description><pubDate>11/13/2009 10:42:46 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>7</id><title>Bonding</title><link>http://www.evgroup.com/de/products/bonding/?version=1</link><description /><pubDate>11/13/2009 10:18:56 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>8</id><title>&lt;p&gt;Integrierte Bonding&lt;/p&gt;
&lt;p&gt;Systeme&lt;/p&gt;</title><link>http://www.evgroup.com/de/products/bonding/integrated_bonding/?version=1</link><description /><pubDate>11/13/2009 10:14:58 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>9</id><title>Wafer Bonding Systeme</title><link>http://www.evgroup.com/de/products/bonding/waferbonding/?version=1</link><description /><pubDate>11/13/2009 10:12:18 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>10</id><title>Prozesstechnologie</title><link>http://www.evgroup.com/de/services/evg_application_lab/?version=1</link><description /><pubDate>10/28/2009 7:21:33 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>11</id><title>GEMINIFB® Production Fusion Bonding System</title><link>http://www.evgroup.com/de/products/bonding/integrated_bonding/geminifb/?version=1</link><description>EV Group's GEMINIFB provides a fully automated and integrated platform for wafer-to-wafer alignment and wafer bonding.</description><pubDate>10/19/2009 12:21:03 PM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>12</id><title>EVG®620 Automated UV-NIL, µ-CP System</title><link>http://www.evgroup.com/de/products/lithography/nil_systems/evg620_uv-nil/?version=1</link><description>The EVG620 Automated NIL System allows for imprint processes with stamps to substrates ranging from small chip size pieces up to 150 mm in diameter.</description><pubDate>10/1/2009 6:53:44 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>13</id><title>EVG®520IS Semi-automated Wafer Bonding System</title><link>http://www.evgroup.com/de/products/bonding/waferbonding/evg520is/?version=1</link><description>The EVG520IS Semi-automated Wafer Bonding System is configurable for all wafer bonding processes such as anodic, thermo compression, fusion bonding, or LowTemp plasma bonding.</description><pubDate>10/1/2009 6:30:38 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>14</id><title>EVG®510 Semi-automated Wafer Bonding System</title><link>http://www.evgroup.com/de/products/bonding/waferbonding/evg510semi/?version=1</link><description>The EVG510 Semi-automated Wafer Bonding System is configurable for all wafer bonding processes such as anodic, thermo compression, fusion bonding, or LowTemp plasma bonding.</description><pubDate>10/1/2009 6:30:02 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>15</id><title>EVG®120 Automated Resist Processing System</title><link>http://www.evgroup.com/de/products/lithography/coaters_developers/evg120/?version=1</link><description>The EVG120 Automated Resist Processing System is an economical tool for quality spin coating and develop processes, especially for standard photoresist applications.</description><pubDate>10/1/2009 6:17:57 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>16</id><title>EVG®620 Automated Mask Alignment System</title><link>http://www.evgroup.com/de/products/lithography/mask_aligners/evg620semiauto/?version=1</link><description>Mask Alignment System designed for optical double-side lithography. Volume production types and manual R&amp;D systems are available.</description><pubDate>10/1/2009 6:13:36 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>17</id><title>Resist Processing Systems</title><link>http://www.evgroup.com/de/products/lithography/coaters_developers/?version=1</link><description /><pubDate>9/30/2009 11:35:38 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>18</id><title>Mask Alignment Systems</title><link>http://www.evgroup.com/de/products/lithography/mask_aligners/?version=1</link><description /><pubDate>9/30/2009 11:34:15 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>19</id><title>EVG®40  Top-to-bottom side Measurement System</title><link>http://www.evgroup.com/de/products/lithography/inspection_systems/evg40/?version=1</link><description>EV Group offers systems for highly accurate destruction-free alignment accuracy measurements designed for all processes that involve double sided lithography.</description><pubDate>9/30/2009 7:49:06 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>20</id><title>SmartView®NT  Bond Alignment System for Universal Alignment</title><link>http://www.evgroup.com/de/products/bonding/bondalignment/smartviewnt/?version=1</link><description>For wafer-to-wafer alignment via alignment keys in bond interface. </description><pubDate>9/30/2009 7:41:45 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item></channel></rss>