<?xml version="1.0" encoding="UTF-8"?><rss version="2.0"><channel><title>EVG Products</title><link>http://www.evgroup.com/feeds/products</link><description>EVG Products</description><item><id>1</id><title>&lt;p&gt;Temporary Bonding and &lt;/p&gt;
&lt;p&gt;Debonding Systems &lt;/p&gt;</title><link>http://www.evgroup.com/en/products/bonding/temporary_bonding/?version=1</link><description /><pubDate>1/8/2010 7:26:14 AM</pubDate><author>Kinz Lisa</author><type>Section</type></item><item><id>2</id><title>&lt;p&gt;Nanoimprint Lithography&lt;/p&gt;
&lt;p&gt;Systems (UV-NIL, µCP, HE)&lt;/p&gt;</title><link>http://www.evgroup.com/en/products/lithography/nil_systems/?version=1</link><description /><pubDate>11/13/2009 10:49:45 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>3</id><title>IQ Aligner® Automated UV-NIL, µ-CP System</title><link>http://www.evgroup.com/en/products/lithography/nil_systems/iqaligneruvnil/?version=1</link><description>The IQ Aligner Automated UV-NIL, µ-CP System allows for micromolding and nanoimprinting processes with stamps and wafers from 150 mm to 300mm diameter,</description><pubDate>11/13/2009 10:47:40 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>4</id><title>IQ Aligner® Automated Mask Alignment System</title><link>http://www.evgroup.com/en/products/lithography/mask_aligners/lithography_iq_aligner/?version=1</link><description>The IQ Aligner Automated Mask Alignment System is based on a field-proven, robust design with up to 300 mm wafer size capability, full-field exposure, single and double-side alignment, large gap and dark field mask alignment.</description><pubDate>11/13/2009 10:45:07 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>5</id><title>EVG®620 Automated Mask Alignment System</title><link>http://www.evgroup.com/en/products/lithography/mask_aligners/evg620semiauto/?version=1</link><description>Automated Mask Alignment System designed for optical double-side lithography. Volume production types and manual R&amp;D systems are available.</description><pubDate>11/13/2009 10:43:14 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>6</id><title>Mask Alignment Systems</title><link>http://www.evgroup.com/en/products/lithography/mask_aligners/?version=1</link><description /><pubDate>11/13/2009 10:43:06 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>7</id><title>Wafer Bonding Systems</title><link>http://www.evgroup.com/en/products/bonding/waferbonding/?version=1</link><description /><pubDate>11/13/2009 10:19:41 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>8</id><title>Bonding</title><link>http://www.evgroup.com/en/products/bonding/?version=1</link><description /><pubDate>11/13/2009 10:19:21 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>9</id><title>Integrated Bonding Systems</title><link>http://www.evgroup.com/en/products/bonding/integrated_bonding/?version=1</link><description /><pubDate>11/13/2009 10:15:17 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>10</id><title>Bond Alignment Systems</title><link>http://www.evgroup.com/en/products/bonding/bondalignment/?version=1</link><description /><pubDate>11/13/2009 9:46:54 AM</pubDate><author>Reiter Anna</author><type>Section</type></item><item><id>11</id><title>Process Technology</title><link>http://www.evgroup.com/en/services/evg_application_lab/?version=1</link><description /><pubDate>10/7/2009 8:42:19 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>12</id><title>GEMINI® Automated Production Wafer Bonding System</title><link>http://www.evgroup.com/en/products/bonding/integrated_bonding/gemini/?version=1</link><description>EV Group's GEMINI provides a fully automated and integrated platform for wafer-to-wafer alignment and wafer bonding.</description><pubDate>9/30/2009 8:07:27 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>13</id><title>EVG®40 Top-to-bottom side Measurement System</title><link>http://www.evgroup.com/en/products/lithography/inspection_systems/evg40/?version=1</link><description>EV Group offers systems for highly accurate destruction-free alignment accuracy measurements designed for all processes that involve double sided lithography.</description><pubDate>9/30/2009 7:49:44 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>14</id><title>SmartView®NT Bond Alignment System for Universal Alignment</title><link>http://www.evgroup.com/en/products/bonding/bondalignment/smartviewnt/?version=1</link><description>For wafer-to-wafer alignment via alignment keys in bond interface. </description><pubDate>9/30/2009 7:40:41 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>15</id><title>SmartView® Bond Alignment System for Universal Alignment</title><link>http://www.evgroup.com/en/products/bonding/bondalignment/smartview/?version=1</link><description>The SmartView Aligner offers a proprietary method for micron level face-to-face wafer level alignment.</description><pubDate>9/30/2009 7:40:20 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>16</id><title>EVG®850 Automated Production Bonding System for SOI </title><link>http://www.evgroup.com/en/products/bonding/soi_bonding/evg850prod/?version=1</link><description>The EVG850 is designed to fulfill a wide range of fusion wafer bonding applications, with main focus on SOI substrates manufacturing. The EVG850 is the only production bonding system built to operate in high throughput, high-yield environments.</description><pubDate>9/30/2009 7:34:22 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>17</id><title>GEMINIFB® Production Fusion Bonding System</title><link>http://www.evgroup.com/en/products/bonding/integrated_bonding/geminifb/?version=1</link><description>EV Group's GEMINIFB provides a fully automated and integrated platform for wafer-to-wafer alignment and wafer bonding.</description><pubDate>9/30/2009 7:28:50 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>18</id><title>Resist Processing Systems</title><link>http://www.evgroup.com/en/products/lithography/coaters_developers/?version=1</link><description /><pubDate>9/29/2009 12:42:52 PM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>19</id><title>EVG®770 Automated NIL Stepper</title><link>http://www.evgroup.com/en/products/lithography/nil_systems/evg770/?version=1</link><description>EV Group's NIL Stepper is designed for step and repeat large area UV-Nanoimprint Lithography (UV-NIL) processes compatible for 100 mm up to 300 mm wafers.</description><pubDate>9/29/2009 6:55:59 AM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item><item><id>20</id><title>EVG®620NT Automated Mask Alignment System</title><link>http://www.evgroup.com/en/products/lithography/mask_aligners/evg620nt/?version=1</link><description>Known for its high level of automation and reliability, the EVG®620NT bond aligner is designed for wafer-to-wafer alignment up to 150 mm wafer sizes.</description><pubDate>9/28/2009 1:48:07 PM</pubDate><author>Auinger Maria Gerlinde</author><type>Section</type></item></channel></rss>