EVG®6200∞ Automated NIL System

For pattern creation in UV-curable materials from a prestructured stamp to a substrate.

Substrate / Wafer parameters:
Size: 3", 100mm, 150mm, up to 200 x 200mm; Thickness: 0.1 - 10mm
Stamp parameters: Size: 25mm x 25mm up to 200mm; Thickness: <7mm
General system configuration:
Desktop system: standard; System rack: option; Vibration isolation: passive
Alignment accuracy:
Top side alignment: ± 1.0 µm 3σ; by using dedicated Moiré alignment keys +/- 100 nm can be reached
Large gap alignment: Option / ± 1.5µm 3σ
NanoAlign: Option
Alignment stage:
Precision micrometers: Manual, motorized (option)
Wedge compensation: Internal 0.5 - 40N contact force
Exposure:
Modes: soft and vacuum contact
Resolution: < 50 nm, mainly dependent on CD of stamp
Wavelength: 200 - 240 nm / 240 - 280 nm / 280 - 350 nm / 350 - 450 nm, filters (option)
Mercury arc lamp: 350 / 500 / 1000 W
Automatic alignment: Option
Handling system: 3 cassette stations, 5 stations (option), field upgradeable
SECS/GEM II: Option