EVG®6200∞ Automated NIL System

For pattern creation in UV-curable materials from a prestructured stamp to a substrate.

 

The EVG6200∞ is the culmination of EV Group's new aligner-technology roadmap. A variety of stamps and substrates sizes from 75mm-to-200mm can be accommodated on the EVG6200∞ for nanoimprint lithography applications.

Features

  • Nanoimprint lithography and micro contact printing
  • UV light exposure
  • Dedicated tooling for UV-NIL
  • Accommodation of both soft and hard stamps
  • Type of substrates: Si, glass, compound semiconductors