IQ Aligner® - Automated µ-CP System

For semi-automatic or fully-automatic single and double-side  µ-CP processes.

 

Technical Papers
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Fabrication of 3D-photonic crystals via UV-nanoimprint lithography
Abstract: Optical lithography will reach its limits due to the diffraction effects encountered and the necessity for using complex resolution enhancement techniques like optical proximity correction (OPC), phase shift masks (PSM) and off-axis illumination [1]. The restrictions on wavelength, in combination with high process and equipment costs make low cost, simple imprinting techniques competitive with next generation lithography methods...



Fabrication of 3D-photonic crystals via UV-nanoimprint lithography
Abstract: The restrictions on wavelength, in combination with high process and equipment costs make low cost, simple imprinting techniques competitive with next generation lithography methods. There are several Nanoimprint Lithography (NIL) techniques which can be categorized depending on the process parameters and the imprinting method – either step and repeat or full wafer single step imprinting...



Fabrication process of 3D-photonic crystals via UV-nanoimprint lithography
Abstract: In recent years the standard lithography reached its limits due to the diffraction effects encountered and the necessary complexity of compatible masks and projection optics. The restrictions on wavelength, in combination with high process and equipment costs make low cost, simple imprinting techniques competitive with next generation lithography methods...



Nanoimprint lithography a next generation high volume lithography technique
Abstract: Nanoimprint Lithography has been demonstrated to be one of the most promising next generation techniques for large-area structure replication in the nanometer scale. This fast and low cost method becomes an increasingly important instrument for fabrication of biochemistry, µ-fluidic, µ-TAS and telecommunication devices, as well as for a wide variety of fields in the nm range, like biomedical, nano-fluidics, nano-optical applications, data storage, etc...



One micron precision optically aligned method for hot-embossing and nanoimprinting
Abstract: This paper reports an optically aligned hotembossing and imprinting method for biomedical, microfluidic, and microoptical sensors. Hot-embossing technology is a low cost, flexible fabrication method, which has demonstrated high aspect ratio polymer microstructures as well as nanoimprinting patterns. It uses polymer substrates to imprint a pattern created on a master stamp...



Soft UV-based nanoimprint lithography for Large area imprinting applications
Abstract:  The International Technology Roadmap for Semiconductors (ITRS) lays out a quite challenging path for the further development of the patterning techniques needed to create the ever-smaller feature sizes. In recent years the standard lithography reached its limits due to the diffraction effects encountered and the necessary complexity of compatible masks and projection optics...
 

Transition of MEMS technology to nanofabrication
Abstract: The transition of MEMS technology to nano fabrication is a solution to the growing demand for smaller and high-density feature sizes in the nanometer scale. Techniques for fabricating µm-, and nm-features will be discussed, and results achieved with nanoimprinting technologies will be presented...