Nanoimprint Lithography (NIL) is one of the most promising and
cost-effective new techniques for generating nanometer-scale-resolution
patterns for a variety of commercial applications in BioMEMS,
microfluidics, optics, patterned media and electronics.
Hot embossing technology is a low cost, flexible fabrication method, which
has demonstrated polymer high aspect ratio microstructures as well as
nanoimprinting patterns. It uses polymer substrates to imprint structures
created on a master stamp. This allows the stamp to produce many fully
patterned substrates using a wide range of materials. Hot embossing is
therefore suited for applications from rapid prototyping to high volume
production. Hot Embossing can be applied in a wide variety of fields: µTAS,
microfluidics (micromixers, microreactors), microoptics (wave guides,
Micro Contact Printing
An inked stamp transfers a
material to a substrate surface by a soft contact, which forms a
self-assembled monolayer (SAM). In this method soft stamps like PDMS are
used. The process occurs at room temperature and under low contact forces.
(UV-NIL) uses low viscose materials, which are cross-linked during a UV
exposure process forming the hard polymer features. These features can be
used as the actual device or can be used as an etching mask for pattern
transfer in the substrate.
EV Group offers equipment for
UV-based nanoimprinting and micro contact printing.