Nanoimprint Lithography (NIL) is one of the most promising and cost-effective new techniques for generating nanometer-scale-resolution patterns for a variety of commercial applications in BioMEMS, microfluidics, optics, patterned media and electronics.
Hot embossing technology is a low cost, flexible fabrication method, which has demonstrated polymer high aspect ratio microstructures as well as nanoimprinting patterns. It uses polymer substrates to imprint structures created on a master stamp. This allows the stamp to produce many fully patterned substrates using a wide range of materials. Hot embossing is therefore suited for applications from rapid prototyping to high volume production. Hot Embossing can be applied in a wide variety of fields: µTAS, microfluidics (micromixers, microreactors), microoptics (wave guides, switches) etc.
Micro Contact Printing
An inked stamp transfers a material to a substrate surface by a soft contact, which forms a self-assembled monolayer (SAM). In this method soft stamps like PDMS are used. The process occurs at room temperature and under low contact forces.
UV-Nanoimprint Lithography (UV-NIL) uses low viscose materials, which are cross-linked during a UV exposure process forming the hard polymer features. These features can be used as the actual device or can be used as an etching mask for pattern transfer in the substrate.
EV Group offers equipment for hot embossing, UV-based nanoimprinting and micro contact printing.