ST. FLORIAN, AUSTRIA - February 7, 2007 - EV Group
announced it has formed a collaborative product development partnership
with GenISys GmbH for the development and marketing of a simulation
platform for advanced mask aligner lithography processes. The first
technological advance to come out of this partnership is GenISys Layout
LAB, an easy-to-use simulation platform for mask aligner lithography.
As pioneers in the area of simulation of lithography for mask aligners, EV
Group and GenISys are combining their experience and knowledge to create
brand new software, which opens up very new opportunities for optimizing
equipment, layout and processes, saving development time, cost and
increasing the yield in manufacturing. Layout LAB will also be a good tool
for process documentation, verification and trouble shooting the
manufacturing process.
"Lithography is one of the critical process steps defining the final
pattern of a device feature", said Alois Malzer, product manager of EV
Group. " Differing from the sub-micron semiconductor manufacturing, MEMS
processes are primarily based on conventional mask aligner exposure
(proximity printing) because of low cost, high throughput and the ability
to pattern thick resists. The MEMS industry with much shorter product
cycles requires a lot of effort for setting up optimal process parameters.
Traditionally those parameters such as mask design, resist type, film
thickness, light source type/spectrum, exposure dose and proximity gap are
optimized by a large number of costly experiments. Due to time and cost
limitations optimal process parameters will often not be applied to
production resulting in limited yield. Simulation enables optimizing the
design and process in short time without "burning" wafers."
"Layout LAB lithography simulation software can significantly reduce the
number of experiments and support the process engineer in getting better
yield or troubleshooting", said Ulrich Hofmann, founder and general manager
of GenISys. "Preliminary investigations with this "virtual lab" allow the
user to define the right starting point for potential experiments."
The brand new simulator Layout LAB of GenISys GmbH developed in strong
co-operation with EVG is capable of precisely simulating the mask aligner
lithography process. The software models the optical system of a mask
aligner consisting of light source (shape, wavelength spectrum, light
divergence, exposure dose), mask pattern (arbitrary design), and proximity
gap to calculate resulting 3D intensity distribution and resist contour on
the wafer within seconds. The modular, process flow oriented VisualFlowTM
platform combines performance, flexibility and user-friendliness. The
printability of a layout can be verified and optimized with a view clicks,
New Resolution Enhancement Techniques (RET), OPC (optical proximity
correction) structures and phase shift masks can be developed in short time
without burning wafers or producing masks. The Layout LAB software is
available at www.EVGTshop.com and www.genisys-gmbh.de.
About GenISys GmbH
Based in Munich, Germany, GenISys GmbH develops, markets and supports
flexible, high-performance software solutions for the highly efficient
processing of large layout data and the optimization of microstructure
fabrication processes. Addressing the market for direct-write e-Beam and
optical lithography, GenISys combines deep technical expertise in layout
data processing, process modeling, correction and optimization with
high-caliber software engineering and a focus on ease of use. GenISys
products give researchers, IC and MEMS manufacturers and system suppliers
unparalleled efficiency, ease of use and optimal value in research,
development and production of new micro-patterning technologies. As a
company focused on customer service, GenISys delivers fast, flexible
support for integration, customization and development of specialized
functionality to meet unique customer needs. For more information on
GenISys, visit genisys-gmbh.de.
Contact:
Nezih Ünal
GenISys GmbH
Forststr. 39A
D-85521 Riemerling, Germany
Phone: + 49 89 5480 6879
Fax: + 49 89 5480 6883
E-Mail: unal@genisys-gmbh.de
About EV Group
EV Group (EVG) is a world leader in wafer-processing solutions for
semiconductor, MEMS and nanotechnology applications. Through close
collaboration with its global customers, the company implements its
flexible manufacturing model to develop reliable, high-quality,
low-cost-of-ownership systems that are easily integrated into customers’
fab lines. Key products include wafer bonding,
lithography/nanoimprint lithography (NIL) and metrology equipment, as well
as photoresist coaters, cleaners and inspection systems.
In addition to its dominant share of the market for wafer bonders, EVG
holds a leading position in NIL and lithography for advanced packaging and
MEMS. Along these lines, the company co-founded the EMC-3D consortium
in 2006 to create and help drive implementation of a cost-effective
through-silicon via (TSV) process for major ICs and MEMS/sensors.
Other target semiconductor-related markets include silicon-on-insulator
(SOI), compound semiconductor and silicon-based power-device solutions.
Founded in 1980, EVG is headquartered in St. Florian, Austria, and operates
via a global customer support network, with subsidiaries in Tempe, AZ;
Albany, NY; Yokohama and Fukuoka, Japan; Seoul, Korea and Chung-Li,
Taiwan. The company's unique Triple i-approach (invent - innovate -
implement) is supported by a vertical integration, allowing EVG to respond
quickly to new technology developments, apply the technology to
manufacturing challenges and expedite device manufacturing in high volume.
Contacts:
EV Group
Tel: +43 7712 5311 0
E-mail: Marketing@EVGroup.com
Marie Labrie
Vice President
MCA, Inc.
Tel: +1-650-968-8900, ext. 119
E-mail: mlabrie@mcapr.com