NanoAlign Technology
EV Groupīs new NanoAlign Technology improves competitiveness of full-field lithography by providing the industryīs highest alignment accuracy and resolution at lowest cost of ownership. The new NanoAlign Technology features active run-out control and sub-100nm dynamic alignment resolution, complemented by UV-Nanoimprint (UV-NIL) capability. EV Groupīs NanoAlign Technology is especially useful for packaging up to 300-mm wafers, UV-NIL, micro-contact printing, SAW devices and optical gratings. It is available on all EV Groupīs mask aligner platforms, including the all-new EVG6200 Infinity aligner which was launched during SEMICON West 2004. The new EVG6200 Infinity aligner is designed for all MEMS, compound semiconductor, nanoimprint lithography and power-device applications as well as the wafer-bumping and chip-scale packaging markets. |
