EVG®40NT Automated Measurement System

For alignment accuracy measurements

 

EVG®40 NT

  • Substrate parameters:
    Substrate size: 300 mm
  • Alignment stage:
    Measurement area X/Y: ± 150 mm
  • Measurement Repeatibility*:
    Single Layer Overlay / CD: ± 0.01 µm (3 σ)
    Multi Layer Overlay / T2B: ± 0.07 µm (3 σ)  
  • Measurement Reproducibility*:
    Single Layer Overlay / CD: ± 0.03 µm (3 σ)
    Multi Layer Overlay / T2B:  ± 0.1 µm (3 σ)
  • Throughput**:
    Single Layer Overlay / CD: up to 2500 measurements / hour
    Multi Layer Overlay / T2B: up to 1250 measurements / hour

 

EVG®Alignment Verification Module (AVM)

  • Substrate parameters:
    Substrate size: 300 mm
  • Alignment stage:
    Measurement area X/Y: ± 150 mm
  • Measurement Repeatibility*:
    Single Layer Overlay / CD: ± 0.03 µm (3 σ)
    Multi Layer Overlay / T2B: ± 0.15 µm (3 σ)  
  • Measurement Reproducibility*:
    Single Layer Overlay / CD: ± 0.1 µm (3 σ)
    Multi Layer Overlay / T2B:  ± 0.2 µm (3 σ)
  • Throughput**:
    Single Layer Overlay / CD: up to 2000 measurements / hour
    Multi Layer Overlay / T2B: up to 1000 measurements / hour

*: depending upon substrate conditions
**: depending upon required recipe settings