Technical Papers
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Fabrication of 3D-photonic
crystals via UV-nanoimprint lithography
Abstract: Optical lithography will reach its limits due to the
diffraction effects encountered and the necessity for using complex resolution
enhancement techniques like optical proximity correction (OPC), phase shift
masks (PSM) and off-axis illumination [1]. The restrictions on wavelength, in
combination with high process and equipment costs make low cost, simple
imprinting techniques competitive with next generation lithography
methods...
Fabrication of 3D-photonic
crystals via UV-nanoimprint lithography
Abstract: The restrictions on wavelength, in combination with
high process and equipment costs make low cost, simple imprinting techniques
competitive with next generation lithography methods. There are several
Nanoimprint Lithography (NIL) techniques which can be categorized depending on
the process parameters and the imprinting method – either step and repeat or
full wafer single step imprinting...
Fabrication process of
3D-photonic crystals via UV-nanoimprint lithography
Abstract: In recent years the standard lithography reached its
limits due to the diffraction effects encountered and the necessary complexity
of compatible masks and projection optics. The restrictions on wavelength, in
combination with high process and equipment costs make low cost, simple
imprinting techniques competitive with next generation lithography
methods...
Nanoimprint lithography a
next generation high volume lithography technique
Abstract: Nanoimprint Lithography has been demonstrated to be
one of the most promising next generation techniques for large-area structure
replication in the nanometer scale. This fast and low cost method becomes an
increasingly important instrument for fabrication of biochemistry, µ-fluidic,
µ-TAS and telecommunication devices, as well as for a wide variety of fields in
the nm range, like biomedical, nano-fluidics, nano-optical applications, data
storage, etc...
One micron precision
optically aligned method for hot-embossing and
nanoimprinting
Abstract: This paper reports an optically aligned hotembossing
and imprinting method for biomedical, microfluidic, and microoptical sensors.
Hot-embossing technology is a low cost, flexible fabrication method, which has
demonstrated high aspect ratio polymer microstructures as well as
nanoimprinting patterns. It uses polymer substrates to imprint a pattern
created on a master stamp...
Soft UV-based nanoimprint
lithography for Large area imprinting applications
Abstract: The International Technology Roadmap for
Semiconductors (ITRS) lays out a quite challenging path for the further
development of the patterning techniques needed to create the ever-smaller
feature sizes. In recent years the standard lithography reached its limits due
to the diffraction effects encountered and the necessary complexity of
compatible masks and projection optics...
Transition of MEMS
technology to nanofabrication
Abstract:
The transition of MEMS technology to nano fabrication is a solution to the
growing demand for smaller and high-density feature sizes in the nanometer
scale. Techniques for fabricating µm-, and nm-features will be discussed,
and results achieved with nanoimprinting technologies will be presented...