Technical
Papers
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Fabrication of
3D-photonic crystals via UV-nanoimprint lithography
Abstract: Optical lithography will reach its limits due to
the diffraction effects encountered and the necessity for using complex
resolution enhancement techniques like optical proximity correction (OPC),
phase shift masks (PSM) and off-axis illumination [1]. The restrictions on
wavelength, in combination with high process and equipment costs make low
cost, simple imprinting techniques competitive with next generation
lithography methods...
Fabrication of
3D-photonic crystals via UV-nanoimprint lithography
Abstract: The restrictions on wavelength, in combination
with high process and equipment costs make low cost, simple imprinting
techniques competitive with next generation lithography methods. There are
several Nanoimprint Lithography (NIL) techniques which can be categorized
depending on the process parameters and the imprinting method – either step
and repeat or full wafer single step imprinting...
Fabrication process of
3D-photonic crystals via UV-nanoimprint lithography
Abstract: In recent years the standard lithography reached
its limits due to the diffraction effects encountered and the necessary
complexity of compatible masks and projection optics. The restrictions on
wavelength, in combination with high process and equipment costs make low
cost, simple imprinting techniques competitive with next generation
lithography methods...
Nanoimprint
lithography a next generation high volume lithography
technique
Abstract: Nanoimprint Lithography has been demonstrated to
be one of the most promising next generation techniques for large-area
structure replication in the nanometer scale. This fast and low cost method
becomes an increasingly important instrument for fabrication of
biochemistry, µ-fluidic, µ-TAS and telecommunication devices, as well as
for a wide variety of fields in the nm range, like biomedical,
nano-fluidics, nano-optical applications, data storage, etc...
One micron precision
optically aligned method for hot-embossing and
nanoimprinting
Abstract: This paper reports an optically aligned
hotembossing and imprinting method for biomedical, microfluidic, and
microoptical sensors. Hot-embossing technology is a low cost, flexible
fabrication method, which has demonstrated high aspect ratio polymer
microstructures as well as nanoimprinting patterns. It uses polymer
substrates to imprint a pattern created on a master stamp...
Soft UV-based
nanoimprint lithography for Large area imprinting
applications
Abstract: The International Technology Roadmap for
Semiconductors (ITRS) lays out a quite challenging path for the further
development of the patterning techniques needed to create the ever-smaller
feature sizes. In recent years the standard lithography reached its limits
due to the diffraction effects encountered and the necessary complexity of
compatible masks and projection optics...
Transition of MEMS technology to nanofabrication
Abstract: The transition of MEMS technology to nano
fabrication is a solution to the growing demand for smaller and
high-density feature sizes in the nanometer scale. Techniques for
fabricating µm-, and nm-features will be discussed, and results achieved
with nanoimprinting technologies will be presented...