The EVG6200∞ is the culmination of EV Group's new aligner-technology roadmap. A variety of stamps and substrates sizes from 75mm-to-200mm can be accommodated on the EVG6200∞ for nanoimprint lithography applications.
- Nanoimprint lithography and micro contact printing
- UV light exposure
- Dedicated tooling for µ-CP
- Accommodation of both soft and hard stamps
- Type of substrates: Si, glass, compound semiconductors