• Go to the main navigation
  • Go to content

 
EV Group
login
t-shop

  • EVGroup.com>>
  • Produkte>>
  • Lithographie>>
  • Mask Alignment Systems>>
  • IQ Aligner®

IQ Aligner® Automated Mask Alignment System

Optimized for contactless proximity processing at highest throughput. Most accurate print gap control and unmatched uptime are fully addressing HVM requirements.

Overview Technical Data Gallery Downloads Videos

 

 

 

Please click the player window to start the video. 

 


Produkte

  • Lithographie
    • Mask Alignment Systems
      • EVG®610
      • EVG®620
      • EVG®620HBL Gen II
      • EVG®620NT
      • EVG®6200∞
      • EVG®6200NT
      • IQ Aligner®
    • Resist Processing Systems
    • Lithography Track Systems
    • Nanoimprint Lithographie Systeme (UV-NIL, µCP, HE)
    • Inspektionssysteme
  • Bonding
  • Prozesstechnologie
Suche nach Produkten

News und Events

EV Group bringt neue Generation des EVG120 Automated Resist Processing Systems auf den Markt

EV Group liefert 300mm Wafer Bonding System an führende chinesische Halbleiter-Foundry

weitere News ..

ECTC 2013

sensors expo & conference 2013

weitere Events ..


198x350_hr-banner
See Also

Related Markets

Technische Publikationen

Product Range

EV Group Corporate Video

3D InCites reports on EVG Headquarters expansion and technology developments

EV Group HR Video

References

 
  • Über EVG
    • Overview
    • Vision/Mission
    • Awards
    • Certificates
    • Veranstaltungen
      • EVG Technology Days and Workshops
    • Firmengeschichte
    • Pressemitteilungen
      • News Archiv 2012
      • News Archiv 2011
      • News Archiv 2010
      • News Archiv 2009
      • News Archiv 2008
      • News Archiv 2007
      • Picture Gallery
    • Einkauf
      • Bedarfe
        • Mechanische Teile
        • Elektronische Teile
        • Pneumatische Teile
        • Fluid Teile
        • Vakuum Teile
        • Optische Teile
      • Einkaufsbedingungen
      • Anforderungen
      • Einkaufsportal
    • Partner & Mitgliedschaften
    • Umweltpolitik
  • Produkte
    • Overview
    • Lithographie
      • Mask Alignment Systems
        • EVG®610
        • EVG®620
        • EVG®620HBL Gen II
        • EVG®620NT
        • EVG®6200∞
        • EVG®6200NT
        • IQ Aligner®
      • Resist Processing Systems
        • EVG®101
        • EVG®101LA
        • EVG®105
        • EVG®120
        • EVG®150
        • EVG®150N
      • Lithography Track Systems
        • Hercules®
      • Nanoimprint Lithographie Systeme (UV-NIL, µCP, HE)
        • EVG®620
        • EVG®6200∞
        • IQ Aligner®
        • EVG®770
        • EVG®510HE
        • EVG®520HE
        • EVG®750
      • Inspektionssysteme
        • EVG®40
        • EVG®40NT
    • Bonding
      • Wafer Bonding Systeme
        • EVG®501
        • EVG®510
        • EVG®520IS
        • EVG®540
        • EVG®540C2W
        • EVG®560
        • EVG®560HBL
      • Bond Alignment Systeme
        • EVG®620
        • EVG®6200∞
        • SmartView®
        • SmartView®NT
      • Integrierte Bonding Systeme
        • Gemini®
        • GeminiFB®
      • SOI Bonding Systeme
        • EVG®301
        • EVG®320
        • EVG®810LT
        • EVG®850
      • Temporary Bonding und Debonding Systeme
        • EVG®805
        • EVG®850TB
        • EVG®850DB
        • EVG®820
        • ZoneBOND®
        • XT Frame Platform
      • Inspektionssysteme
        • EVG®20
        • EVG®40NT
        • Prozesstechnologie
    • Prozesstechnologie
  • Lösungen
    • Overview
    • 3D IC
      • Introduction
      • Chip Stacking for 3D IC
      • Advanced C2W Bonding
      • Wafer Bonding for 3D IC
      • Thin Wafer Processing
        • Introduction
        • Tape Debonding
        • Thermal Slide Off Debonding
        • EVG® LowTemp™ ZoneBOND®
          • Introduction
          • Open Platform
    • CMOS Image Sensors
      • Introduction
      • Backend Lithography
      • Glass Bonding
      • Oxide Bonding
    • High Brightness LEDs
      • Introduction
      • Layer Transfer
      • Imprint Lithography
      • Optical Lithography
      • Thin Wafer Handling
    • Logic / Memory
      • Introduction
      • Backend Lithography
      • Wafer Level Bonding
      • C2W Bonding
      • Thin Wafer Handling
    • MEMS Devices
      • Introduction
      • Lithography
      • First Level Packaging
    • Microfluidics
      • Introduction
      • Hot Embossing
      • Wafer Level Bonding
    • SAW Devices
      • Introduction
      • Wafer Level Bonding
    • SOI Wafers
      • Introduction
      • Cleaning
      • Plasma Activation
      • Oxide Bonding
    • Wafer Level Optics
      • Introduction
      • Imprint Lithography
      • UV Bonding
    • Photovoltaics
      • Introduction
      • Imprint Lithography
      • Micro Optics
      • Wafer Bonding
      • Thin PV Wafers
      • Spray Coating
      • Optical Lithography
      • Anti-Reflective Coatings
  • Märkte
    • Overview
    • Advanced Packaging, 3D Interconnect
    • Verbindungshalbleiter und Leistungsbauteile aus Silizium
    • MEMS
    • Nanotechnologie
    • SOI & Engineered Substrates
  • Service
    • Overview
    • Prozesstechnologie
    • Support
      • Field-Service
      • Technical Support Call Center
      • Spare Parts
      • Product Improvements & Upgrades
      • Training
        • Training Request
      • Equipment Warranty
      • Preventive Maintenance Agreement
      • On-site Service Agreement
  • Karriere
  • Kontakt

 
© EV Group, ALL RIGHTS RESERVED